Measurements of Diffusion Coefficients of Water in Electron Cyclotron Resonance Plasma SiO_2
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概要
- 論文の詳細を見る
This work proposes a method for measuring the diffusion coefficients of water in the ECR (electron cyclotron resonance) plasma CVD SiO_2 used for inter-metal dielectrics. The diffusion coefficients are calculated from TPD (temperature programmed desorption) spectra of water measured for a sample SiO_2/SOG (spin on glass)/Si structure. In this method, the SOG film is used for a water source. The water diffusion coefficient in ECR SiO_2 films measured using this method points to large water blocking power comparing with fused silica.
- 社団法人応用物理学会の論文
- 1993-03-15
著者
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TAKAHASHI Yasuo
NTT LSI Laboratories
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NAMATSU Hideo
NTT LSI Laboratories
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MINEGISHI Kazushige
NTT LSI Laboratories
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MACHIDA Katsuyuki
NTT LSI Laboratories
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