Water-Adsorbed States on Silicon and Silicon Oxide Surfaces Analyzed by using Heavy Water

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1990-03-20

著者

• Saito Kazuyuki

  Ntt Lsi Laboratories

• Yabumoto Norikuni

  Ntt Lsi Laboratories

• MINEGISHI Kazushige

  NTT LSI Laboratories

• KOMINE Yukio

  NTT LSI Laboratories

関連論文

• A Unified Analysis on Hot Carrier Generation in p-Channel and n-Channel MOSFET's : Special Section : Solid State Devices and Materials 2 : Silicon Devices and Process Technologies
• Photoemission Study on Initial Oxidation of Si Surfaces by Super-Pure Oxygen Gas
• Oxidation Process of Hydrogen Terminated Silicon Surface Studied by Thermal Desorption Spectroscopy
• Water-Adsorbed States on Silicon and Silicon Oxide Surfaces Analyzed by using Heavy Water
• Measurements of Diffusion Coefficients of Water in Electron Cyclotron Resonance Plasma SiO_2

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