High-Rate Deposition of Ferrite Films in Aqueous Solution by Light-Enhanced Ferrite Plating
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概要
- 論文の詳細を見る
By irradiating the substrate surface with a Xe-lamp at 450 W/cm^2, the deposition rate of Fe_3O_4 film in ferrite plating was increased by a factor of 10 (from〜30 nm/min to〜320 nm/min). The high deposition rate in light-enhanced ferrite plating cannot be simply ascribed to the increase of thermal energy.
- 社団法人応用物理学会の論文
- 1990-08-20
著者
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Itoh Tomoyuki
Department Of Biological Mechanisms And Functions Graduate School Of Bioagricultural Sciences Nagoya
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Abe Masanori
Department Of Physical Electronics Tokyo Institute Of Technology
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Tamaura Y
Research Center For Carbon Recycling & Utilization Tokyo Institute Of Technology
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Tamaura Yutaka
Department Of Chemistry Tokyo Institute Of Technology
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Abe Masanori
Department Of Anesthesiology Faculty Of Medicine University Of The Ryukyus
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HORI Seiichiro
Department of Physical Electronics, Tokyo Institute of Technology
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ITOH Tomoyuki
Department of Physical Electronics, Tokyo Institute of Technology
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