Deoxidization of Iridium Oxide Thin Film
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概要
- 論文の詳細を見る
Deoxidization phenomenon of iridium oxide (IrO_2) film, which has been used as a diffusion barrier for ferroelectric capacitors, is investigated changing the temperature and oxygen pressure during the post process. The deoxidization is well understood by explaining the relationship between the temperature and dissociation pressure according to the thermodynamics. A simple thermodynamic calculation for the deoxidization of IrO_2 gives a guideline for successive process condition at which the stability of IrO_2 films can be maintained.
- 社団法人応用物理学会の論文
- 1999-10-01
著者
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Lee Hee
Department Of Chemistry Pohang University Of Science And Technology
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Cha S
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Cha Seon
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Lee Hee
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Lee Hee
Department Of Anesthesiology And Pain Medicine Hanyang University College Of Medicine
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Cha Seon
Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746, Korea
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