Intraband Relaxation Time in Wurtzite GaN/InAlN Quantum-Well
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概要
- 論文の詳細を見る
The intraband relaxation time in a wurtzite GaN/InAlN quantum well (QW) is investigated theoretically as a function of the compressive strain and well thickness. The results are compared with those obtained for an InGaAs/InGaAsP(1.13 eV) QW. It is found that the total linewidth broadening of GaN/InAlN QW is nearly independent of the compressive strain because the in-plane effective masses are not affected by the strain. On the other hand, the total linewidth of an InGaAs/InGaAsP QW significantly decreases with increasing strain. The linewidths for carrier-phonon scattering of a GaN/InAlN QW are much greater than those of an InGaAs/InGaAsP QW. The relaxation times for the electron-phonon and hole-phonon scatterings are estimated to be about 10 and 3 fs, respectively. Also, it is shown that the total linewidth of a GaN/InAlN QW is nearly constant irrespective of the well thickness.
- 社団法人応用物理学会の論文
- 1999-07-15
著者
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Ahn Doyeol
Institute Of Quantum Information & Processing Systems University Of Seoul
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Park Seoung-hwan
Department Of Electronic Engineering Catholic University Of Daegu
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AHN Doyeol
Institute of Quantum Information Processing and Systems, University of Seoul
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