Raman Study on the Silicon Network of Hydrogenated Amorphous Silicon Films Deposited by a Glow Discharge
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1985-04-20
著者
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TSUDA Shinya
Research Center, Sanyo Electric Co., Ltd.
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KUWANO Yukinori
Research Center, Sanyo Electric Co., Ltd.
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Watanabe K
Department Of Physics Tokyo University Of Science
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WATANABE Kaneo
Research Center, SANYO Electric Co., Ltd.
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HISHIKAWA Yoshihiro
Research Center, SANYO Electric Co., Ltd.
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OHNISHI Michitoshi
Research Center, SANYO Electric Co., Ltd.
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Kuwano Yukinori
Research And Development Center Sanyo Electric Co. Ltd.
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Hishikawa Y
New Materials Research Center Sanyo Electric Co. Ltd.
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Hishikawa Yoshihiro
Research Center for Photovoltaic Technologies, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
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