HISHIKAWA Yoshihiro | Research Center, SANYO Electric Co., Ltd.

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著作論文

Preparation and Properties of a-SiGe:H:F Films by a Glow Discharge Decomposition
Raman Study on the Silicon Network of Hydrogenated Amorphous Silicon Films Deposited by a Glow Discharge
Preparation and Properties of a-SiGe:H Films Fabricated with a Super Chamber (Separated Ultra-High Vacuum Reaction Chamber)
Preparation and Properties of High-Quality a-Si Films with a Super Chamber : Separated Ultra-High Vacuum Reaction Chamber
Superlattice Structure a-Si Films Fabricated by the Photo-CVD Method and their Application to Solar Cells
A New Analytical Method of Amorphous Silicon Solar Cells

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