Fabrication of Au Fine Patterns by Ar Sputter Etching Using MoO_3 Mask

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-03-15

著者

• BABA Mamoru

  Department of Quantum Science and Energy Engineering, Tohoku University

• Ikeda Toshiaki

  Murata Mfg. Co. Ltd.

• Baba M

  Iwate Univ. Morioka

• Baba Mamoru

  Faculty Of Engineering Iwate University

• Baba M

  Department Of Electronic Engineering Faculty Of Engineering Iwate University

• Okamoto M

  Osaka Univ. Osaka Jpn

• IKEDA TOSHIO

  Department of Nephrology, Kantou-Teishin Hospital

• Baba M

  Univ. Tokyo Kashiwa Jpn

• Baba Mamoru

  Department Of Electrical And Electronic Engineering Iwate University

• OKAMOTO Masaaki

  Department of Oral Bacteriology, School of Dental Medicine, Turumi University

• Ikeda T

  Univ. Tsukuba Ibaraki Jpn

• Okamoto M

  Department Of Electrical Engineering Osaka University

• KUMAGAI Kei

  Department of Electronic Engineering, Faculty of Engineering, Iwate University

• Okamoto Masaaki

  Department Of Oral Bacteriology School Of Dental Medicine Turumi University

• Ikeda Toshio

  Department Of Hypertension And Cardiorenal Medicine Dokkyo Medical University

• Ikeda Toshio

  Department Of Electronic Engineering Faculty Of Engineering Tohoku University

• Kumagai K

  Tohoku Univ. Sendai Jpn

• Ikeda Toshio

  Department Of Chemistry Faculty Of Science Shizuoka University

• Ikeda Toshio

  Department Electronic Engineering Faculty Of Engineering Tohoku University

• Ikeda Toshio

  Department of Applied Chemistry, The University of Tokyo

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