Fabrication of Au Microelectrodes with Photopolymerization of Triazine Dithiol Thin Films
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概要
- 論文の詳細を見る
In this article, we report a new lift-off process to fabricate Au microelectrodes with photopolymerization of 6-diallylamino-[1,3,5]triazine-2,4-dithiol (DA) thin films, which is easier, more energy saving, and friendlier to the environment than the past processes. The optimum conditions for fabricating fine Au/poly(DA) microelectrodes are as follows: DA film thickness is 40 nm and UV irradiation time is 20 min. The Au/poly(DA) microelectrodes with over 10 μm spaces were developed and could be well applied to pentacene thin-film transistors with a mobility of 1.3\times 10^{-1} cm2 V-1 s-1 and a threshold voltage of -13.4 V.
- 2011-10-25
著者
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Baba Mamoru
Faculty Of Engineering Iwate University
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Ye Rongbin
Faculty Of Engineering Iwate University
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Baba Mamoru
Faculty of Engineering, Iwate University, Morioka 020-8551, Japan
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Ohta Koji
Faculty of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551, Japan
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Sato Yuya
Graduate School of Engineering, Iwate University, Morioka 020-8551, Japan
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Ohta Koji
Faculty of Engineering, Iwate University, 3-18-8 Ueda, Morioka 020-8551, Japan
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Ohta Koji
Faculty of Engineering, Iwate University, Morioka 020-8551, Japan
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Ye Rongbin
Faculty of Engineering, Iwate University, Morioka 020-8551, Japan
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