多層薄膜構造へのレーザ照射時の温度分布解析

概要

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A numerical simulation approach for the evaluation of temperature distribution analysis in multi-layer thin film structures during laser irradiation, such as the laser patterning of a-Si solar cells and the laser annealing of silicon on insulator (SOI) device, is introduced. In order to analyze more correctly and realistically, temperature dependence of material constants for each layer and latent heat during phase change has been taken into account, and the motions of heat conduction during laser irradiation have been made clear by solving the three dimensional non-linear and transitive heat conduction equations using the finite difference method. Results have been compared with experiments, and it has been confirmed that the numerical simulation approach was very useful for laser processing.
公益社団法人精密工学会の論文
1990-08-05