Formation of Nickel Self-Aligned Silicide by Using Cyclic Deposition Method
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概要
- 論文の詳細を見る
- 2004-09-15
著者
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IKARASHI Nobuyuki
System Devices Research Laboratories, NEC Corporation
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Yoshihara Takuya
System Devices Research Laboratories Nec Corporation
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Miura Yoshinao
System Devices Research Laboratories Nec Corporation
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Manabe Katsuya
System Devices Research Laboratories Nec Corporation
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WAKABAYASHI Hitoshi
System Devices and Fundamental Research, NEC Corporation
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Tanaka Masayasu
System Devices Research Laboratories Nec Corporation
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MANABE Kenzo
System Devices Research Laboratories, NEC Corporation
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TERASHIMA Koichi
System Devices Research Laboratories, NEC Corporation
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OSHIDA Makiko
R&D Support Center, NEC Corporation
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Wakabayashi Hitoshi
System Devices Research Laboratories Nec Corporation
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Wakabayashi Hitoshi
System Devices And Fundamental Research Nec Corporation
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Oshida Makiko
System Devices Research Laboratories Nec Corporation
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IKARASHI Nobuyuki
NEC Corporation, Device Platforms Research Laboratories
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Terashima Koichi
System Devices Research Laboratories Nec Corporation
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Ikarashi N
Nec Corporation Device Platforms Research Laboratories
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Ikarashi Nobuyuki
System Devices Research Laboratories Nec Corporation
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Manabe Kenzo
System Devices Research Laboratories Nec Corporation
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