Second Breakdown of 18V Grounded Gate NMOS induced by the Kirk Effect under Electrostatic Discharge

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-09-15

著者

• Lee Seung-chul

  Fairchild Semiconductor Dodang-dong

• Han Min-Koo

  School of Electrical Engineering, Seoul National University

• JEON Byung-Chul

  School of Electrical Eng. & Computer Science #50, Seoul National University

• LEE Seung-Chul

  School of Electrical Engineering (#50), Seoul National University

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