A Self-Aligned Gate AlGaAs/GaAs Heterostructure Field-Effect Transistor with an Ion-Implanted Buried-Channel for use in High Efficiency Power Amplifiers
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1998-06-01
著者
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Uchitomi N
Research And Development Center Toshiba Corp.
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Uchitomi Naotaka
Research And Development Center Toshiba Corporation
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NITTA Tomohiro
Research and Development Center, TOSHIBA CORPORATION
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YOSHIMURA Misao
Research and Development Center, TOSHIBA CORPORATION
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KITAURA Yoshiaki
Research and Development Center, TOSHIBA CORPORATION
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Tanabe Yoshikazu
Research Institutefor Polymers And Textiles
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MIHARA Masakatsu
Research and Development Center, Toshiba Corp.
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NISHIHORI Kazuya
Research and Development Center, Toshiba Corporation
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KAKIUCHI Yorito
Research and Development Center, Toshiba Corporation
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Tanabe Yoshikazu
Research And Development Center Toshiba Corp.
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- A Self-Aligned Gate AlGaAs/GaAs Heterostructure Field-Effect Transistor with an Ion-Implanted Buried-Channel for use in High Efficiency Power Amplifiers