Hwang Cheol | School Of Mat. Sci. And Eng. Seoul National Univ
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概要
関連著者
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Hwang Cheol
School Of Mat. Sci. And Eng. Seoul National Univ
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Hwang Cheol
School Of Materials Science And Engineering Seoul National University
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Kim Hyeong
School Of Electrical And Electronics Engineering Chung-ang University
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Hwang Cheol
Semiconductor R&d Center Samsung Electronics Co.
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Hwang Cheol
School of Material Science and Engineering, Seoul National University
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Kim Hyeong
School of Materials Science and Engineering, Seoul National University
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Park Jaehoo
School Of Material Science And Engineering Seoul National University
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Kim Hyeong
School Of Materials Science & Engineering Seoul National University
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Kang Sang
School Of Chemical Engineering College Of Engineering Seoul National University
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PARK Jaehoo
School of Materials Science & Engineering, Seoul National University
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Kim Hyeong
School Of Materials Science And Engineering Seoul National University
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Choi K
Seoul National Univ. Seoul Kor
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Choi Kook
School Of Materials Science And Engineering Seoul National University
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Kwon Oh
School Of Material Science And Engineering Seoul National University
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Hwang Chul
Jusung Engineering
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Kang Sang
School of Materials Science and Engineering, Seoul National University
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Lee Seok
School of Materials Science and Engineering, Seoul National University
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Hong Suk-kyoung
Feram Device Team Memory R&d Division Hynix Semiconductor
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Hong Suk-kyoung
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd.
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Hong Suk
Memory Research And Development Division Hyundai Electronics Industries Co. Ltd.
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Lee Seok
School Of Materials Science And Engineering Seoul National University
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Hong Soon-kil
Dong Il Technology Ltd.
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Lee S.k.
Display Device Research Lab. Lg Electronics Corp.
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Han Young
Jusung Engineering
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Hong S.-k.
Feram Device Team Memory R&d Division Hynix Semiconductor
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Yang Cheol
Jusung Engineering
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Yang Doo
Jusung Engineering
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Yoon Euijoon
School Of Electronic And Electrical Engineering Kyungpook National University
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YOON Euijoon
School of Materials Science and Engineering, Seoul National University
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Ha Jowoong
Inostek Inc.
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Hwang Cheol
School Of Material Science And Engineering Seoul National University
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Lee Jong-ho
Advanced Process & Development Team System Lsi Division & 3technology & Development Team
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Park Dong-yeon
Inostek Inc.
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Lee Dong-su
Inostek Inc
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Woo Hyun-jung
Inostek Inc
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Lee Nae-in
Advanced Process & Development Team System Lsi Division & 3technology & Development Team
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Cho Hoon
Department Of Physics Dongguk University
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Jeon In
School Of Materials Science & Engineering Seoul National University
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Kang Ho-kyu
Advanced Process & Development Team System Lsi Division & 3technology & Development Team
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EOM Dail
School of Materials Science & Engineering, Seoul National University
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Park Chan
Department Of Anatomy College Of Medicine Kyung Hee University
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Kim S‐h
Prowtech Inc. Chungbuk Kor
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Lim Han-jin
Process Development Team Memory Division Semiconductor Business Samsung Electronics Co. Ltd.
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LEE Jong
School of Electrical Engineering, Seoul National University
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Yoon E
Seoul National Univ. Seoul Kor
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Yoon Euijoon
School Of Materials Science And Engineering And Isrc Seoul National University
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Yoon Euijoon
School Of Materials Science And Engineering And Inter-university Semiconductor Research Center Seoul
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Lee J
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Lee Jong
School Of Adv. Mat. Sci. & Eng. Sungkyunkwan Univ.
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Kim H
Chungnam National Univ. Taejon Kor
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PARK Joon-Shik
Nano Mechatronics Research Center, Korea Electronics Technology Institute
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YANG Jeong-Suong
R&D Center, Inostek Inc.
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KIM Seung-Hyun
R&D Center, Inostek Inc.
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HA Jowoong
R&D Center, Inostek Inc.
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LEE Dong-Su
Inostek, Inc,
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PARK Dong-Yeon
Inostek, Inc
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WOO Hyun-Jung
Inostek, Inc
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HA Jowoong
Inostek, Inc
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Kim Sung-tae
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Ha Jowoong
R&d Center Inostek Inc.
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Hwang Cheol
School Of Materials Science & Engineering Seoul National University
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Hwang Cheol
School Of Materials Science And Engineering And Inter-university Semiconductor Research Center Seoul
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Lee Dong-su
Inostek Inc.
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Yoon Euijoon
School Of Mat. Sci. And Eng. Seoul National Univ
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Woo Hyun-jung
Inostek Inc.
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Kim Jong
Sejong University
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PARK Chan
Department of Anatomy, College of Medicine, Kyung Hee University
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LEE Nae-In
Advanced Technology Center, Samsung Electronics Co. Ltd.
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Park Joon-shik
Nano Mechatronics Research Center Korea Electronics Technology Insitute
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Shin J
Korea Inst. Sci. And Technol. Seoul Kor
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KOO Chang
R&D Center, INOSTEK Inc.
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YEOM Jung-Hoon
R&D Center, INOSTEK Inc.
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KANG Sung-Goon
Div. Of Mat. Sci. and Eng., Han Yang Univ
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KIM Dong-Joo
Div. Of Mat. Sci., Argonne National Laboratory
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CHO Hoon
Department of Physics, Dongguk University
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Kang S‐g
Div. Of Mat. Sci. And Eng. Han Yang Univ
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PARK Young
Samsung Advanced Institute of Technology
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Jung Ji
Samsung Advanced Institute Of Technology (sait)
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KIM Beom
School of Materials Science and Engineering, Seoul National University
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SHIN Ju
School of Materials Science and Engineering, Seoul National University
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HONG Jae
Department of Physics, Seoul National University
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KHIM Zheong-Gu
Department of Physics, Seoul National University
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Park Chan
Department Of Physics Dongguk University
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Kim Do
Samsung Advanced Institute Of Technology (sait)
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Lee Kwanghee
Process Development Team Memory Division Semiconductor Business Samsung Electronics Co. Ltd.
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Koo C
R&d Center Inostek Inc.
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Yoo Cha-young
Process Development Team Memory Division Semiconductor Business Samsung Electronics Co. Ltd.
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Lee J
Hynix Semiconductor Inc. Kyoungki‐do Kor
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Park Kyung
Samsung Advanced Institute Of Technology (sait)
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Kwon Jang
Samsung Advanced Institute Of Technology (sait)
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Yang J‐s
R&d Center Inostek Inc.
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Kim H
School Of Materials Science & Engineering Seoul National University
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Kim Jin
Process Development Team Memory Division Semiconductor Business Samsung Electronics Co. Ltd.
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Kim Dong-joo
Div. Of Mat. Sci. Argonne National Laboratory
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Khim Zheong-gu
Department Of Physics Seoul National University
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Yeom Jung-hoon
R&d Center Inostek Inc.
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Park Jaehoo
School Of Materials Science & Engineering Seoul National University
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Eom Dail
School Of Materials Science & Engineering Seoul National University
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Koo C
Inostek Inc. Gyeonggi Kor
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Hong Jae
Department Of Neurosurgery Catholic University Of Korea St. Vincent's Hospital
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Hong Jae
Department Of Physics Seoul National University
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Noguchi Takashi
Samsung Advanced Institute Of Technology (sait)
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Kim Sung-Tae
Process Development Team, Memory Division, Semiconductor Business, Samsung Electronics Co., Ltd., San #24 Nongseo-ri, Giheung-eup, Yongin, Gyeonggi-do, 449-711, Korea
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Yoo Cha-Young
Process Development Team, Memory Division, Semiconductor Business, Samsung Electronics Co., Ltd., San #24 Nongseo-ri, Giheung-eup, Yongin, Gyeonggi-do, 449-711, Korea
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Lim Han-Jin
Process Development Team, Memory Division, Semiconductor Business, Samsung Electronics Co., Ltd., San #24 Nongseo-ri, Giheung-eup, Yongin, Gyeonggi-do, 449-711, Korea
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Lee Kwanghee
Process Development Team, Memory Division, Semiconductor Business, Samsung Electronics Co., Ltd., San #24 Nongseo-ri, Giheung-eup, Yongin, Gyeonggi-do, 449-711, Korea
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Kim Jin
Process Development Team, Memory Division, Semiconductor Business, Samsung Electronics Co., Ltd., San #24 Nongseo-ri, Giheung-eup, Yongin, Gyeonggi-do, 449-711, Korea
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Hwang Cheol
School of Materials Science and Engineering, Seoul National University, San #56-1, Shillim-dong, Kwanak-ku, Seoul 151-742, Korea
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Kim Hyeong
School of Materials Science and Engineering, Seoul National University, San #56-1, Shillim-dong, Kwanak-ku, Seoul 151-742, Korea
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Cho Hoon
Department of Physics, Dongguk University, Seoul 100-715, Korea
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Jeon In
School of Materials Science & Engineering, Seoul National University, San 56-1, Seoul, Korea
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Park Dong-Yeon
Inostek Inc., 356-1 Gasan-dong, Keumchun-gu, Seoul 153-023, Korea
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Hwang Cheol
School of Materials Science & Engineering, Seoul National University, San 56-1, Seoul, Korea
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Park Chan
Department of Physics, Dongguk University, Seoul 100-715, Korea
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Kim Hyeong
School of Materials Science & Engineering, Seoul National University, San 56-1, Seoul, Korea
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Noguchi Takashi
Samsung Advanced Institute of Technology
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Ha Jowoong
Inostek Inc., 356-1 Gasan-dong, Keumchun-gu, Seoul 153-023, Korea
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Kang Ho-Kyu
Advanced Process & Development TEAM, System LSI Division & 3Technology & Development TEAM, Samsung Electronics Co., Ltd., San#24, Nongseo-Ri, Kiheung-Eup, Yongin-City, Kyungki-Do, Korea
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Yoon Euijoon
School of Materials Science and Engineering and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-742, Korea
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Eom Dail
School of Materials Science & Engineering, Seoul National University, San 56-1, Seoul, Korea
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Woo Hyun-Jung
Inostek Inc., 356-1 Gasan-dong, Keumchun-gu, Seoul 153-023, Korea
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Park Jaehoo
School of Materials Science & Engineering, Seoul National University, San 56-1, Seoul, Korea
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Lee Dong-Su
Inostek Inc., 356-1 Gasan-dong, Keumchun-gu, Seoul 153-023, Korea
著作論文
- Dielectric and Electromechanical Properties of Pb(Zr,Ti)O_3 Thin Films for Piezo-Microelectromechanical System Devices
- Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition
- Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition
- Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition
- Control of the Microstructure of (Pb, La) TiO_3 Thin Films by Metal-Organic Chemical Vapor Deposition Using a Solid Delivery System for Ferroelectric Domain Memory
- Effects of the Microstructure of Platinum Electrode on the Oxidation Behavior of TiN Diffusion Barrier Layer
- Post-Annealing Effects on Fixed Charge and Slow/Fast Interface States of TiN/Al_2O_3p-Si Metal-Oxide-Semiconductor Capacitor
- Degradation Behavior in the Remnant Polarization of SrBi_2Ta_2O_9 Thin Films by Hydrogen Annealing and its Recovery by Post-annealing.
- Degradation Behavior in the Remnant Polarization of SrBi_2Ta_2O_9 Thin Films by Hydrogen Annealing and its Recovery by Post-annealing.
- Degradation Behavior in the Remnant Polarization of SrBi_2Ta_2O_9 Thin Films by Hydrogen Annealing and its Recovery by Post-annealing.
- Optimization of Postannealing Process for Low Temperature MOCVD (Ba, Sr) TiO_3 Thin Films
- Optimization of Postannealing Process for Low Temperature MOCVD (Ba, Sr) TiO_3 Thin Films
- Optimization of Postannealing Process for Low Temperature MOCVD (Ba, Sr)TiO_3 Thin Films
- Investigation of Ru/TiN Bottom Electrodes Prepared by Chemical Vapor Deposition
- Post-Annealing Effects on Fixed Charge and Slow/Fast Interface States of TiN/Al2O3/p-Si Metal–Oxide–Semiconductor Capacitor
- Effects of the Microstructure of Platinum Electrode on the Oxidation Behavior of TiN Diffusion Barrier Layer