Noguchi Takashi | Samsung Advanced Institute Of Technology (sait)

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概要

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著作論文

Advanced Poly-Si TFT with Fin-Like Channels (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
Advanced Poly-Si TFT with Fin-Like Channels (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
Low Temperature Poly-Si Thin Film Transistor on Plastic Substrates(Thin Film Transistors, Fundamental and Application of Advanced Semiconductor Devices)
Low temperature poly-Si thin film transistor on plastic substrates(Session A4 Thin Film Transistor)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
Low temperature poly-Si thin film transistor on plastic substrates(Session A4 Thin Film Transistor)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
Low temperature poly-Si thin film transistor on plastic substrates
A 385-500GHz Low Noise Superconductor-Insulator-Superconductor Mixer for ALMA Band 8( Superconducting High-frequency Devices)
The First Radioastronomical Observation with Photonic Local Oscillator
Oxygen Effect on Laser Crystallization of Sputtered a-Si Film on Plastic Substrate
Experimental Results of SIS Mixers with Distributed Junction Arrays
Analysis of The Bandwidth Performance of SIS Mixers with Distributed Junction Arrays
Parallel Connected Twin SIS Junctions for Millimeter and Submillimeter Wave Mixers
Development of a 500-GHz Band SIS Mixer
Parallel Connected Twin SIS Junctions for Millimeter and Submillimeter Wave Mixers : Analysis and Experimental Verification
Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition (
Excimer Laser Annealing of PbZr_Ti_O_3 Thin Film at Low Temperature(Electronic Materials)
Optimization of Postannealing Process for Low Temperature MOCVD (Ba, Sr)TiO_3 Thin Films
A New Approach of Polycrystalline Silicon Film on Plastic Substrate Prepared by Ion Beam Deposition Followed by Excimer Laser Crystallization at Room Temperature
Tensile-Strained Single-Crystal Si Film on Insulator by Epitaxially Seeded and Laser-Induced Lateral Crystallization
Low-Temperature Process for Advanced Si Thin Film Transistor Technology
Erratum: "Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition ($
Oxygen Effect on Laser Crystallization of Sputtered a-Si Film on Plastic Substrate

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