Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition (<150℃) and Laser Crystallization for Polycrystalline Silicon Thin-Film Transistor Application
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2006-03-25
著者
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Lim Hyuck
Samsung Advanced Institute of Technology, Kihung-Eup Yongin-Si
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Noguchi Takashi
Samsung Advanced Institute of Technology, Kihung-Eup Yongin-Si
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Kim Jong-man
Samsung Advanced Institute Of Technology (sait)
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Jung Ji-sim
Samsung Advanced Institute Of Technology (sait)
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Lee Sung-hyun
Department Of Electronics Engineering Sejong University
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Cho Chul-lae
Department Of Electronics Engineering Sejong University
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Kwon Jang-yeon
Samsung Advanced Institute Of Technology (sait)
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Lim Hyuck
Samsung Advanced Institute Of Technology (sait)
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HONG Wan-Shick
Department of Electronics Engineering, Sejong University
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PARK Kuyng-Bae
Samsung Advanced Institute of Technology (SAIT)
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LEE Kyung-Eun
Department of Electronics Engineering, Sejong University
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KIM Do-Young
Samsung Advanced Institute of Technology (SAIT)
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Lee Kyung-eun
Department Of Electronics Engineering Sejong University
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Hong Wan-shick
Department Of Electronics Engineering Sejong University
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Lee Sung-hyun
Department Of Animal Sciences Chungbuk National University
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Noguchi Takashi
Samsung Advanced Institute Of Technology (sait)
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Lee Kyung-Eun
Department of Biotechnology, College of Life Science and Biotechnology, Yonsei University
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Lim Hyuck
Samsung Advanced Institute of Technology
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Noguchi Takashi
Samsung Advanced Institute of Technology
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