Erratum: "Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition ($<$150 °C) and Laser Crystallization for Polycrystalline Silicon Thin-Film Transistor Application"
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概要
- 論文の詳細を見る
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2006-05-25
著者
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Kim Jong-man
Department Of Chemical Engineering Colledge Of Engineering Hanyang University
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Jung Ji-sim
Samsung Advanced Institute Of Technology (sait)
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Cho Chul-lae
Department Of Electronics Engineering Sejong University
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Kwon Jang-yeon
Samsung Advanced Institute Of Technology (sait)
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PARK Kuyng-Bae
Samsung Advanced Institute of Technology (SAIT)
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KIM Do-Young
Samsung Advanced Institute of Technology (SAIT)
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Hong Wan-shick
Department Of Electronics Engineering Sejong University
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Lee Sung-hyun
Department Of Animal Sciences Chungbuk National University
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Noguchi Takashi
Samsung Advanced Institute Of Technology (sait)
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Lee Kyung-Eun
Department of Biotechnology, College of Life Science and Biotechnology, Yonsei University
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Lim Hyuck
Samsung Advanced Institute of Technology
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Kwon Jang-Yeon
Samsung Advanced Institute of Technology (SAIT), San 24, Nongseo-ri, Kiheung-eup, Yongin, Kyunggi-do 449-901, Korea
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Cho Chul-Lae
Department of Electronics Engineering, Sejong University, 98 Kunja-dong, Kwangjin-gu, Seoul 143-747, Korea
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Kim Jong-Man
Department of Electronics Engineering, Sejong University, 98 Kunja-dong, Kwangjin-gu, Seoul 143-747, Korea
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Lee Sung-Hyun
Department of Electronics Engineering, Sejong University, 98 Kunja-dong, Kwangjin-gu, Seoul 143-747, Korea
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Noguchi Takashi
Samsung Advanced Institute of Technology
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Lee Kyung-Eun
Department of Electronics Engineering, Sejong University, 98 Kunja-dong, Kwangjin-gu, Seoul 143-747, Korea
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Jung Ji-Sim
Samsung Advanced Institute of Technology (SAIT), San 24, Nongseo-ri, Kiheung-eup, Yongin, Kyunggi-do 449-901, Korea
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- Erratum: "Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition ($
- Oxygen Effect on Laser Crystallization of Sputtered a-Si Film on Plastic Substrate