Kim Hyeong | School Of Electrical And Electronics Engineering Chung-ang University

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概要

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著作論文

Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition
Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition
Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition
Control of the Microstructure of (Pb, La) TiO_3 Thin Films by Metal-Organic Chemical Vapor Deposition Using a Solid Delivery System for Ferroelectric Domain Memory
Post-Annealing Effects on Fixed Charge and Slow/Fast Interface States of TiN/Al_2O_3p-Si Metal-Oxide-Semiconductor Capacitor
Deep Submicron CMOS Technology Using Top-Edge Round STI and Dual Gate Oxide for Low Power 256M-Bit Model DRAM
Studies of an On-Package Dual-Mode Square-Loop Band Pass Filter for Highly Integrated Wireless Transceivers Using NU-FDTD(Resonators & Filters, Recent Technologies of Microwave and Millimeter-Wave Devices Focusing on Miniaturization and
Influence of Hydrogen Plasma Treatment and Post-Annealing on Defects in 4H-SiC
Investigation of Ru/TiN Bottom Electrodes Prepared by Chemical Vapor Deposition
New DC Arc Discharge Synthesis Method for Carbon Nanotubes Using Xylene Ferrocene as Floating Catalyst
Post-Annealing Effects on Fixed Charge and Slow/Fast Interface States of TiN/Al2O3/p-Si Metal–Oxide–Semiconductor Capacitor
Deep Submicron CMOS Technology Using Top-Edge Round STI and Dual Gate Oxide for Low Power 256 M-Bit Mobile DRAM

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