Effect of the Soft X-rays on Highly Hydrogenated Diamond-Like Carbon Films
スポンサーリンク
概要
- 論文の詳細を見る
The effect of soft X-ray irradiation of diamond-like carbon films in vacuum was investigated using synchrotron radiation (SR). Etching and the desorption of hydrogen upon SR exposure in vacuum occurred in highly hydrogenated diamond-like carbon (H-DLC) films; these processes were not observed in the irradiation of a low-hydrogenated DLC film. The extent of decrease in hydrogen content due to SR exposure was found to decrease with increasing the etching ratio of the H-DLC film. This indicates that hydrogen desorption from the H-DLC films competed with the etching process. Namely, the modified surface, in which hydrogen content was decreased by SR exposure, was immediately removed from the H-DLC film that had a high etching rate.
- 2011-05-25
著者
-
Tagawa Masahito
Department Of Mechanical Engineering Faculty Of Engineering Kobe University
-
Yokota Kumiko
Department Of Mechanical Engineering Faculty Of Engineering Kobe University
-
Matsui Shinji
Laboratory Of Advanced Science And Technolgy For Industory Himeji Institute Of Technology
-
Teraoka Yuden
Surface Chemistry Research Group, Synchrotron Radiation Research Center, Quantum Beam Science Directorate, Japan Atomic Energy Agency, Sayo, Hyogo 679-5198, Japan
-
Teraoka Yuden
Surface Reaction Dynamics Research Group, Reaction Dynamics Research Unit, Quantum Beam Science Directorate, Japan Atomic Energy Agency, Sayo, Hyogo 679-5148, Japan
-
Kanda Kazuhiro
Laboratory of Advanced Science and Technology for Industry (LASTI), University of Hyogo, Kamigori, Hyogo 678-1205, Japan
-
Tagawa Masahito
Department of Mechanical Engineering, Graduate School of Engineering, Kobe University, Kobe 657-8501, Japan
-
Tode Mayumi
Surface Reaction Dynamics Research Group, Reaction Dynamics Research Unit, Quantum Beam Science Directorate, Japan Atomic Energy Agency, Sayo, Hyogo 679-5148, Japan
-
Yokota Kumiko
Department of Mechanical Engineering, Graduate School of Engineering, Kobe University, Kobe 657-8501, Japan
関連論文
- Formation of Thin Oxide Films on Room-Temperature Silicon (100) by Exposure to a Neutral Beam of Hyperthermal Atomic and Molecular Oxygen
- Oxidation Properties of Hydrogen-Terminated SI (001) Surfaces Following Use of a Hyperthermal Broad Atomic Oxygen Beam at Low Temperatures : Instrumentation, Measurement, and Fabrication Technology
- Synchrotron Radiation Photoelectron Emission Study of SiO_2 Film Formed by Hyperthermal O-Atom Beam at Room Temperature
- Effect of Low-Energy Ion Bombardment upon Field-Stimulated Exoelectron Emission from Tungsten Surfaces
- Surface Reaction of a Low-Flux Atomic Oxygen Beam with a Spin-Coated Polymide Film : Synergetic Effect of Atomic Oxygen and Ultraviolet Exposures
- Surface Reaction of a Low Flux Atomic Oxygen Beam with a Spin-Coated Polyimide Film : Translational Energy Dependence on the Reaction Efficiency
- Effects of External Stresses on the Low Temperature Thermal Oxidation of Silicon
- Surface Characterization of Carbon Fibers Exposed to 5 eV Energetic Atomic Oxygen Beam Studied by Wetting Force Measurements
- High growth rate of vertically aligned carbon nanotubes using a plasma shield in microwave plasma-enhanced chemical vapor deposition
- High friction of a vertically aligned carbon-nanotube film in microtribology
- Effect of UV Irradiation on Microlens Arrays Fabricated by Room Temperature Nanoimprinting Using Organic Spin-on-Glass
- Direct Etching of Spin-on-Glass Films Exposed Using Synchrotron Radiation
- Optical Thin Film Formation with O_2 Cluster Ion Assisted Deposition
- Ultra-Smooth Surface Preparation Using Gas Cluster Ion Beams
- Room Temperature Nanoimprint Technology Using Hydrogen Silsequjoxane (HSQ)
- Highly Excited States of Cyanogen Halides in the Extreme Vacuum Ultraviolet Region
- Research Activity on Development and Application of LIGA Technology at New SUBARU, 1.5 GeV Synchrotron Radiation Facility
- Femtosecond Snapshot Holography with Extended Reference Using Extreme Ultraviolet Free-Electron Laser
- Structural Changes in Diamond-Like Carbon Films Fabricated by Ga Focused-Ion-Beam-Assisted Deposition Caused by Annealing
- Fabrication of High-Aspect Si Structures by Deep Reactive Ion Etching Using Hydrogen Silsesquioxane Masks Replicated by Room Temperature Nanoimprinting
- Fabrication of Fine Electron Biprism Filament by Free-Space-Nanowiring Technique of Focused-Ion-Beam + Chemical Vapor Deposition for Accurate Off-Axis Electron Holography
- Soft X-ray Conversion Efficiencies in Laser-Produced Xenon and Tin Plasmas in a 5--17 nm Wavelength Range
- Inhibition of Electrochemical Fouling against Biomolecules on a Diamond-Like Carbon Electrode
- Fabrication of Organic Spin-on-Glass Microring Resonator with a Narrow Gap between a Microring Resonator and a Waveguide Using Nanoimprint Lithography
- Fabrication of Low Line Edge Roughness Mold for Photo-Nanoimprint
- Improvement of neuronal cell adhesiveness on parylene with oxygen plasma treatment(CELL AND TISSUE ENGINEERING)
- Near Edge X-Ray Absorption Fine Structure Study for Optimization of Hard Diamond-Like Carbon Film Formation with Ar Cluster Ion Beam
- Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient
- Thermal Durability of Diamond Like Carbon Films Containing Tungsten Fabricated by Focused-Ion-Beam Chemical Vapor Deposition
- Annealing Effect of W Incorporated Diamond-Like Carbon Fabricated by Ga Focused Ion Beam Chemical Vapor Deposition
- Effect of the Soft X-rays on Highly Hydrogenated Diamond-Like Carbon Films
- Composition Analysis of High-Stable Transparent Conductive Zinc Oxide by X-ray Photoelectron Spectroscopy and Secondary Ion Mass Spectroscopy
- Fabrication of Poly(tetrafluoroethylene) Microparts by High-Energy X-ray-Induced Etching
- Synchrotron Radiation Photoelectron Emission Study of SiO2 Film Formed by Hyperthermal O-Atom Beam at Room Temperature
- Surface Modification of Poly(tetrafluoroethylene) by Synchrotron Radiation Exposure under Several Kinds of Gas Atmosphere
- Study of Demolding Characteristics in Step-and-Repeat Ultraviolet Nanoimprinting
- Surface Modification of Fluorocarbon Polymers by Synchrotron Radiation