Fabrication of Fine Electron Biprism Filament by Free-Space-Nanowiring Technique of Focused-Ion-Beam + Chemical Vapor Deposition for Accurate Off-Axis Electron Holography
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概要
- 論文の詳細を見る
We have developed a new method of producing a fine electron biprism filament by chemical vapor deposition (CVD) in a focused-ion-beam (FIB) system. An 80-nm-diameter filament of diamond-like carbon (DLC) was bridged in 90 s between two tungsten rods fixed on a biprism holder. The filament was stable enough for taking electron holography. Moreover, the fine filament offered not only wider interference regions but also higher fringe contrasts than those of the filament with a diameter of 400 nm that is a common diameter of conventional electron biprism.
- Japan Society of Applied Physicsの論文
- 2008-11-25
著者
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Hirayama Tsukasa
Nanostructures Research Laboratory Japan Fine Ceramics Center
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MATSUI Shinji
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology
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Nakamatsu Ken-ichiro
Laboratory Of Advanced Science And Technology For Industry (lasti) Graduate School Of Science Univer
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Yamamoto Kazuo
Nanostructures Research Laboratory, Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta, Nagoya 456-85
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Matsui Shinji
Laboratory Of Advanced Science And Technology For Industry (lasti) Graduate School Of Science Univer
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Matsui Shinji
Laboratory Of Advanced Science And Technolgy For Industory Himeji Institute Of Technology
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Hirayama Tsukasa
Japan Fine Ceramics Center Nagoya Jpn
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