Nanoimprint Fabrication and Thermal Behavior of Atomically Ultrasmooth Glass Substrates with 0.2-nm-Height Steps

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概要

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• We examined the conditions for the development of atomically stepped ultrasmooth surfaces on commercial silicate glass substrates by the thermal nanoimprint technique using sapphire ($\alpha$-Al₂O₃ single crystal) molds with 0.2-nm-height atomic steps. Under the pressing conditions of 3 MPa, 300 s, and 610 °C for imprinting, a 0.2-nm-high stepped and atomically ultrasmooth terraced surface could be formed on soda-lime silicate glass substrates having the glass transition temperature of 521 °C. We found that the 0.2-nm-height step structure of the imprinted glass surface disappeared after annealing at 490 °C, and the smoothness of the terrace increased.

• 2011-07-25

著者

• HIRAI Yoshihiko

  Graduate School of Engineering, Osaka Prefecture University

• Miyake Yumiko

  Department Cardiology Koshigaya Hospital Dokkyo University School Of Medicine

• Kaneko Satoru

  Department Of Obstetrics And Gynecology Ichikawa General Hospital Tokyo Dental College

• Oi Hideo

  Kyodo International Inc., Kawasaki, 215-0005, Japan

• Yoshimoto Mamoru

  Department of Innovative & Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan

• Akita Yasuyuki

  Department of Innovative & Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan

• Sunagawa Kazuhiko

  Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan

• Mita Masahiro

  Kyodo International Inc., Kawasaki 215-0005, Japan

• Koyama Kohji

  Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan

• Tada Kazuhiro

  Toyama National College of Technology, Toyama 939-8630, Japan

• Kaneko Satoru

  Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan

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