Akita Yasuyuki | Department of Innovative & Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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概要
- Akita Yasuyukiの詳細を見る
- 同名の論文著者
- Department of Innovative & Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japanの論文著者
関連著者
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Akita Yasuyuki
Department of Innovative & Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Yoshimoto Mamoru
Department of Innovative & Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Akita Yasuyuki
Department Of Physics Sophia University
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Miyake Yumiko
Department Cardiology Koshigaya Hospital Dokkyo University School Of Medicine
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Yoshimoto Mamoru
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Oi Hideo
Kyodo International Inc., Kawasaki, 215-0005, Japan
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Mita Masahiro
Kyodo International Inc., Kawasaki 215-0005, Japan
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OHTSUKI Tomi
Department of Physics,Sophia University
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HIRAI Yoshihiko
Graduate School of Engineering, Osaka Prefecture University
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MITSUHASHI Masahiko
Kanagawa Industrial Technology Research Institute
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Ohtsuki Tomi
Department Of Physics Faculty Of Science University Of Tokyo
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AKITA Yasuyuki
Department of Physics,Sophia University
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Hara Wakana
Department Of Advanced Materials Chemistry Graduate School Of Engineering Yokohama National Universi
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Kaneko Satoru
Kanagawa Industrial Technol. Center Kanagawa Jpn
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Nakai Hirokazu
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Kaneko Satoru
Department Of Obstetrics And Gynecology Ichikawa General Hospital Tokyo Dental College
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Watanabe Takahiro
Department Of Civil Engineering The University Of Tokyo
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Kaneko Satoru
Kanagawa Industrial Technology Research Institute, Ebina, Kanagawa 243-0435, Japan
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Mita Masahiro
Kyodo International Inc., Kawasaki, 215-0005, Japan
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Watanabe Takahiro
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan
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Nakai Hirokazu
Department of Innovative & Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Matsuda Akifumi
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan
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Mitsuhashi Masahiko
Kanagawa Industrial Technology Center, Kanagawa Prefectural Government, 705-1 Shimo-Imaizumi, Ebina, Kanagawa 243-0435, Japan
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Akita Yasuyuki
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan
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Miyake Yumiko
Department of Innovative & Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Sunagawa Kazuhiko
Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan
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Hosaka Makoto
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Koyama Kohji
Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan
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Tada Kazuhiro
Toyama National College of Technology, Toyama 939-8630, Japan
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Sugimoto Yuki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Koyama Koji
Crystal Growth Laboratory, Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan
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Kaneko Satoru
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Akita Yasuyuki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
著作論文
- Anderson Transition of Three Dimensional Phonon Modes
- Nanoimprint Fabrication and Thermal Behavior of Atomically Ultrasmooth Glass Substrates with 0.2-nm-Height Steps
- Evolution of Atomically Stepped Surface of Indium Tin Oxide Thin Films Grown on Nanoimprinted Glass Substrates
- Atomically Stepped Glass Surface Formed by Nanoimprint
- Low-Temperature Heteroepitaxial Growth of $\alpha$-Al2O3 Thin Films on NiO Layers by Pulsed Laser Deposition