Hosaka Makoto | Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
スポンサーリンク
概要
- Hosaka Makotoの詳細を見る
- 同名の論文著者
- Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japanの論文著者
関連著者
-
Yoshimoto Mamoru
Department of Innovative & Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
-
Hosaka Makoto
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
-
Kato Yushi
Department Of Electronics And Informatics Faculty Of Engineering Toyama Prefectural University
-
Kaneko Satoru
Kanagawa Industrial Technol. Center Kanagawa Jpn
-
Yamauchi Ryosuke
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
-
SUZUKI Toshimasa
Taiyo Yuden Co Ltd, R&D Center
-
Matsuda Akifumi
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan
-
Mitsuhashi Masahiko
Kanagawa Industrial Technology Center, Kanagawa Prefectural Government, 705-1 Shimo-Imaizumi, Ebina, Kanagawa 243-0435, Japan
-
Akita Yasuyuki
Department of Innovative & Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
-
Kobayashi Keisuke
Taiyo Yuden Co., Ltd., Takasaki, Gunma 370-3347, Japan
-
Arai Hideki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
-
Koyama Kohji
Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan
-
Sugimoto Yuki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
-
Koyama Koji
Crystal Growth Laboratory, Namiki Precision Jewel Co., Ltd., Adachi, Tokyo 123-8511, Japan
-
Akita Yasuyuki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
著作論文
- Fabrication of Ni/Al2O3/Ni Heteroepitaxial Junction by Post-Hydrogen Reduction of NiO/Al2O3/NiO Trilayered Epitaxial Thin Film
- Low-Temperature Heteroepitaxial Growth of $\alpha$-Al2O3 Thin Films on NiO Layers by Pulsed Laser Deposition