Optimal Design for Nonperiodic Fine Grating Structure Controlled by Proximity Correction with Electron-Beam Lithography
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概要
- 論文の詳細を見る
We describe a method for designing nonperiodic fine grating structures such as a small $F$-number diffractive cylindrical lens, to be fabricated by direct-writing electron-beam lithography. The design is based on a resist development simulator for estimating a proximity effect of electron dose and the finite difference time domain (FDTD) method for simulating an electromagnetic field. The surface profile and electron dose distribution are simultaneously optimized to obtain the high diffraction efficiency. For the design of a diffractive lens of 50 μm width and 25 μm focal length, the calculated diffraction efficiency is 49% for 650-nm-wavelength light, which is slightly lower than that of a diffractive lens profile optimized by electromagnetic analysis without restrictions on fabrication limits.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-02-15
著者
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HIRAI Yoshihiko
Graduate School of Engineering, Osaka Prefecture University
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Okano Masato
Nalux Co. Ltd.
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Kikuta Hisao
Graduate School Of Engineering Osaka Prefecture University
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Okano Masato
NALUX Co., Ltd., 2-1-7 Yamazaki, Shimamoto-cho, Mishima, Osaka 618-0001, Japan
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Hirai Yoshihiko
Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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Kikuta Hisao
Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
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