Fabrication of Cantilevers by Two-Step Transfer Process without Lithography

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概要

• 論文の詳細を見る

• A new transfer process for micro-electro-mechanical systems (MEMS) is developed. The process consists of two sequential transfers using two dummy substrates, and MEMS structures are fabricated on a main substrate. Ni cantilevers are also fabricated. All the processes for Ni cantilever pattern fabrication are performed on the first dummy substrate. The second dummy substrate is used for force-free release transfer. Ni cantilevers with long beams and a wide area are fabricated. Two methods are developed to fabricate Ni cantilever patterns without lithography. 1) A silicon template with a cantilever pattern step is used. 2) Selective evaporation is used. Ni cantilevers are successfully fabricated on the main substrate.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2009-06-25

著者

• HIRAI Yoshihiko

  Graduate School of Engineering, Osaka Prefecture University

• Kawata Hiroaki

  Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan

• Hirai Yoshihiko

  Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan

• Yasuda Masaaki

  Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan

• Ryugou Kenichi

  Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan

• Ohta Saki

  Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan

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• Optimal Design for Nonperiodic Fine Grating Structure Controlled by Proximity Correction with Electron-Beam Lithography
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