Highly Precise Atomic Force Microscope Measurement of High-Aspect Nanostructure Free of Probe Bending Error
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概要
- 論文の詳細を見る
A new atomic force microscope (AFM) imaging has been used to study the bending of a sharpened and slim probe in the digital probing method (step-in mode) for the critical dimension (CD)-AFM technique. The bending of the AFM probe indicates a serious problem in measuring very fine patterns with a high aspect ratio with an error of less than 1 nm when we use the sharpened and slim probe. In our estimation, position errors $\Delta r$ (in plane) and $\Delta z$ (in perpendicular) rapidly increase with the slope angle and a controlled force. In experiments, we measured a degradation of the pattern profile as the controlled force increased in the AFM system. We have to control the probe at a force of ${<}2$ nN to be free of probe bending, when we measure very fine pit patterns with a size of ${<}100$ nm and an aspect ratio of ${>}5$ accurately.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-06-15
著者
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Morimoto Takafumi
Hitachi Kenki Fine Tech Co. Ltd.
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Sone Hayato
Department Of Applied Physics The Science University Of Tokyo
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Kembo Yukio
Hitachi Kenki Fine Tech Co. Ltd.
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Terauchi Daisuke
Department Of Nano Material System Graduate School Of Engineering Gunma University
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Koyanagi Hajime
Central Research Lab. Hitachi Ltd.
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Hosaka Sumio
Department Of Electronic Engineering Gunma University
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Hosaka Sumio
Department of Nano Material System, Graduate School of Engineering, Gunma University, 1-5-1 Tenjin, Kiryu 376-8515, Japan
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Koyanagi Hajime
Central Research Lab., Hitachi, Ltd., 1-280 Kokubunji, Tokyo 185-8601, Japan
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Kembo Yukio
Hitachi Kenki Fine Tech, Co. Ltd., 650 Kandatsu, Tsuchiura 300-0013, Japan
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Terauchi Daisuke
Department of Nano Material System, Graduate School of Engineering, Gunma University, 1-5-1 Tenjin, Kiryu 376-8515, Japan
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Morimoto Takafumi
Hitachi Kenki Fine Tech, Co. Ltd., 650 Kandatsu, Tsuchiura 300-0013, Japan
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