A Simple Fabrication Process using Focused Ion Beam for Deep Submicron Magnetic Tunnel Junctions
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概要
- 論文の詳細を見る
Focused ion beam (FIB) induced tungsten deposition technique was applied to fabrication of small (few-hundred-nanometer scale) magnetic tunnel junctions (MTJs). The deposited tungsten pattern was used as an etching mask and a metal connection between an MTJ and a lead line. This fabrication method can eliminate some difficult process steps so that deep submicron-sized MTJs can be fabricated easily and reproducibly. This technique is useful to evaluate basic properties of small MTJs for spin-electronics devices.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2004-11-15
著者
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KUBOTA Hitoshi
Department of Applied Physics, Graduate School of Engineering, Tohoku University
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Ando Yasuo
Department Of Applied Physics Graduate School Of Engineering Tohoku University
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Miyazaki Terunobu
Department Of Applied Physics Faculty Of Engineering Tohoku University
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Ando Yasuo
Department of Applied Physics, Graduate School of Engineering, Tohoku University, Aoba-yama 05, Aoba-ku, Sendai 980-8579, Japan
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Watanabe Daisuke
Department of Applied Physics, Graduate School of Engineering, Tohoku University, Aoba-yama 05, Aoba-ku, Sendai 980-8579, Japan
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Miyazaki Terunobu
Department of Applied Physics, Graduate School of Engineering, Tohoku University, Aoba-yama 05, Aoba-ku, Sendai 980-8579, Japan
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