Annealing Effect on Low-Resistance Ferromagnetic Tunnel Junctions
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-10-15
著者
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遠藤 康夫
高エ研
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ANDO Yasuo
Department of Applied Physics, Graduate School of Engineering, Tohoku University
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MIYAZAKI Terunobu
Department of Applied Physics, Graduate School of Engineering, Tohoku University
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KUBOTA Hitoshi
Department of Applied Physics, Graduate School of Engineering, Tohoku University
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HAYASHI Masamitsu
Department of Applied Physics, Graduate School of Engineering, Tohoku University
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Endoh Yasuo
Core Research For Evolutional Science And Technology (jrcat) : Department Of Physics Tohoku Universi
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Endoh Yasuo
Physics Department Granduate School Of Science Tohoku University
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Han Xiu-feng
Department Of Applied Physics Graduate School Of Engineering Tohoku University
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Ando Yuji
Department Of Applied Physics The University Of Tokyo
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Ando Yasuo
Department Of Applied Physics Graduate School Of Engineering Tohoku University
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Endoh Yasuo
Institute For Materials Research Tohoku University
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Endoh Yasuo
Physics Department Tohoku University
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KAMIJO MAKOTO
Department of Pediatrics, Jikei University School of Medicine
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Miyazaki Terunobu
Department Of Applied Physics Faculty Of Engineering Tohoku University
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Hayashi Masamitsu
Department Of Applied Physics Graduate School Of Engineering Tohoku University
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Yu Andrew
Department Of Applied Physics Graduate School Of Engineering Tohoku University:department Of Materia
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Yu Andrew
Department Of Applied Physics Graduate School Of Engineering Tohoku University
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YAOITA Kazuya
Department of Applied Physics, Graduate school of Engineering, Tohoku University
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Yaoita Kazuya
Department Of Applied Physics Graduate School Of Engineering Tohoku University
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Ando Y
Tokyo Univ. Information Sci. Chiba Jpn
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Kamijo Makoto
Department Of Applied Physics Graduate School Of Engineering Tohoku University
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Endoh Yasuo
Crest Japan Science And Technology Corporation (jst)
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Hayashi Masamitsu
National Institute For Materials Science (nims)
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