Structural and Magnetic Properties of Co2MnSi Heusler Alloy Thin Films on Si

概要

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The structural and magnetic properties of Co2MnSi thin films grown on n-doped Si(110) and Si(100) substrates were studied and observed to have a strong dependence on annealing temperature ($T_{\text{A}}$). At $T_{\text{A}}=275--350$ °C, the Co2MnSi films exhibited the B2 phase with a $\langle 100\rangle$ orientation and a magnetic moment on both substrates. The saturation magnetization ($M_{\text{S}}$) of Co2MnSi thin films was observed to reach a maximum at $T_{\text{A}}=300$ °C, above which it was found to decrease. We consider that at $T_{\text{A}}\simeq 300$ °C, the Co2MnSi thin films on Si substrates exhibited the $\langle 100\rangle$ orientation, a high $M_{\text{S}}$ and a low roughness which might promote spin injection.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2009-08-25