Robust 285 nm Deep UV Light Emitting Diodes over Metal Organic Hydride Vapor Phase Epitaxially Grown AlN/Sapphire Templates
スポンサーリンク
概要
- 論文の詳細を見る
Highly stable deep UV light emitting diodes (LEDs) with peak emission wavelength of 285 nm are reported. The LEDs were deposited via pulsed atomic layer epitaxy over a 15-μm-thick aluminum nitride-sapphire template which was prepared by metalorganic hydride vapor phase epitaxy (MOHVPE). The devices exhibited a stable output power density of 16 W/cm2 at 2 kA/cm2 during cw operation and for unpackaged on-wafer devices cw-power did not saturate till current density of 4 kA/cm2. In contrast, conventional UV LEDs grown on sapphire substrates saturated at approximately 0.5 kA/cm2. The lifetime of MOHVPE LED is estimated to be well over 5000 h. We attribute this superior performance of the MOHVPE LEDs to reduced thermal impedance due to the thick AlN–sapphire template.
- 2007-06-25
著者
-
Adivarahan Vinod
Department Of Ee University Of South Carolina
-
GAEVSKI Mikhail
Department of Electrical Engineering, University of South Carolina
-
Khan Asif
Department Of Ece University Of South Carolina
-
Fareed Qhalid
Department Of Electrical Engineering University Of South Carolina
-
Srivastava Surendra
Department of Electrical Engineering, University of South Carolina, 301 S. Main Street, Columbia, South Carolina 29208, U.S.A.
-
Katona Thomas
Department of Electrical Engineering, University of South Carolina, Columbia, SC 29208, U.S.A.
-
Gaevski Mikhail
Department of Electrical Engineering, University of South Carolina, 301 S. Main Street, Columbia, South Carolina 29208, U.S.A.
-
Katona Thomas
Department of Electrical Engineering, University of South Carolina, 301 S. Main Street, Columbia, South Carolina 29208, U.S.A.
関連論文
- Differential Carrier Lifetime in AlGaN Based Multiple Quantum Well Deep UV Light Emitting Diodes at 325 nm : Semiconductors
- AlGaN/InGaN/GaN Double Heterostructure Field-Effect Transistor : Semiconductors
- Room-Temperature Stimulated Emission from AlN at 214nm
- Low Threshold-14W/mm ZrO_2/AlGaN/GaN Metal-Oxide-Semiconductor Heterostructure Field Effect Transistors
- 10Milliwatt Pulse Operation of 265nm AlGaN Light Emitting Diodes
- Planar Schottky Diodes on High Quality A-plane GaN
- 280nm Deep Ultraviolet Light Emitting Diode Lamp with an AlGaN Multiple Quantum Well Active Region
- Vertical Injection Thin Film Deep Ultraviolet Light Emitting Diodes with AlGaN Multiple-Quantum Wells Active Region
- Ultraviolet Light Emitting Diodes Using Non-Polar a-Plane GaN-ALGaN Multiple Quantum Wells
- A New Selective Area Lateral Epitaxy Approach for Depositing a-Plane GaN over r-Plane Sapphire
- Lateral Epitaxial Overgrowth of Fully Coalesced A-Plane GaN on R-Plane Sapphire
- Lateral Current Crowding in Deep UV Light Emitting Diodes over Sapphire Substrates
- 324 nm Light Emitting Diodes With MilliWatt Powers : Semiconductors
- Submilliwatt Operation of AllnGaN Based Multifinger-Design 315 nm Light Emitting Diode (LED) over Sapphire Substrate : Semiconductors
- Stripe Geometry Ultraviolet Light Emitting Diodes at 305 Nanometers Using Quaternary AlInGaN Multiple Quantum Wells : Semiconductors
- Quaternary AlInGaN Multiple Quantum Wells for Ultraviolet Light Emitting Diodes : Semiconductors
- Matrix Addressable Micro-Pixel 280nm Deep UV Light-Emitting Diodes
- Optically Pumped Lasing at 353nm Using Non-polar a-plane AlGaN Multiple Quantum Wells over r-plane Sapphire
- Micro-pixel Design Milliwatt Power 254nm Emission Light Emitting Diodes
- Sub-Milliwatt Power III-N Light Emitting Diodes at 285 nm
- Continuous Wave Milliwatt Power AlGaN Light Emitting Diodes at 280nm
- 276 nm Substrate-Free Flip-Chip AlGaN Light-Emitting Diodes
- A Hybrid Micro-Pixel Based Deep Ultraviolet Light-Emitting Diode Lamp
- Robust 290 nm Emission Light Emitting Diodes over Pulsed Laterally Overgrown AlN
- Physics of GaN Based Electronic Devices
- Ultraviolet Stimulated Emission From Optically Pumped AlGaN/AlGaN Multiple Quantum Wells on Pulsed Laterally Overgrown a-Plane GaN
- Robust 285 nm Deep UV Light Emitting Diodes over Metal Organic Hydride Vapor Phase Epitaxially Grown AlN/Sapphire Templates
- Room-Temperature Stimulated Emission from AlN at 214 nm
- Enhancement-Mode Insulating-Gate AlInN/AlN/GaN Heterostructure Field-Effect Transistors with Threshold Voltage in Excess of +1.5V
- 10 Milliwatt Pulse Operation of 265 nm AlGaN Light Emitting Diodes
- Metal–Organic Hydride Vapor Phase Epitaxy of AlxGa1-xN Films over Sapphire
- Low Threshold-14 W/mm ZrO2/AlGaN/GaN Metal–Oxide–Semiconductor Heterostructure Field Effect Transistors
- Continuous Wave Milliwatt Power AlGaN Light Emitting Diodes at 280 nm
- Substrate Lifted-off AlGaN/AlGaN Lateral Conduction Thin-Film Light-Emitting Diodes Operating at 285 nm
- Substrate Lifted-off AlGaN/AlGaN Lateral Conduction Thin-Film Light-Emitting Diodes Operating at 285 nm (Special Issue : Recent Advances in Nitride Semiconductors)