P10 超音波照射下での無電解ニッケルめっきによる近接場光学ファイバープローブの開発(物質創製、他)

概要

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We have proposed a method to fabricate fiber probes for near-field optical microscopy based on electroless plating under ultrasonic irradiation. The method involves four steps: (A) chemically etching a high GeO_2 doped silica fiber in a buffered HF solution with a volume ratio of 40%NH_4F : 50%HF : H_2O= 10:1:1, (B, C) the surface activation by immersing in 1.0 g/dm^3-SnCl_2 and 5.0 mg/dm^3-PdCl_2 aqueous solutions, respectively, (D) electroless nickel plating under ultrasonic irradiation. Using 1MHz-PZT plate as the ultrasonic generator for this method, we succeeded in fabricating a near-field optical probe having a submicron-sized tip protruding from a nickel film with reproducibility.
日本ソノケミストリー学会の論文
2003-10-30