909 イオンビームスパッタ法を用いたTi-Ni形状記憶合金薄膜の作製(OS9-3 形状記憶材料の特性と応用)

概要

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An Ion beam sputtering device and segment type TiJNi target were used in order to fabricate Ti/Ni thin film. After sputtering, vacuum annealing treatment was performed in order to obtain the crystallized Ti-Ni thin film. The microstructure and composition of the film was analyzed by X-ray diffractmeter and energy dispersive X-ray spectrometry. Furthermore, the mechanical and tribological characteristics of the film were investigated. As the results, it was confirmed that the thin crystallized Ti-Ni fthn can be obtained by the method. Also, the microstructure and composition of the film is nearly equal to these values of ordinaiy Ti-Ni shape memory alloy. In addition, the film shows a high hardness and low frictional coefficient and superior peel resistance.
2010-10-09