A Precision Floating-Gate Mismatch Measurement Technique for Analog Application(Session 7B : Si IC and Circuit Technology)
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概要
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For analog applications, the MIM capacitance has to be measured at a much higher resolution than using the conventional method, i.e. to a sub-femto level. A new robust mismatch measurement technique is proposed, which is more accurate and robust compared to the conventional FGCM method. A capacitance mismatching measurement methodology based on Vs is more stable than that based on Vf because the influence of pre-existing charge in the floating-gate can be cancelled in Sr, Sm. The accuracy of this method was evaluated through silicon measurement in a 0.13μm technology. It shows that, compared to the ideal value, the average of the new method are within 0.15% compared to 23.9% in conventional method while the standard deviation is within 0.2%.
- 2010-06-23
著者
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JUNG Won-Young
Technical Engineering Center, Dongbu HiTek
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KIM Jong-Min
Technical Engineering Center, Dongbu HiTek
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KIM Jin-Soo
Technical Engineering Center, Dongbu HiTek
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KIM Taek-Soo
Technical Engineering Center, Dongbu HiTek
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Kim Jong-min
Technical Engineering Center Dongbu Hitek
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Jung Won‐young
Device Engineering Team Dongbu Hitek Co. Ltd.
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Jung Won-young
Technical Engineering Center Dongbu Hitek
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Jung Won‐young
Soongsil Univ. Seoul Kor
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Kim Jin-soo
Technical Center Daewoo Motor Co.
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Kim Taek-soo
Technical Engineering Center Dongbu Hitek
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