Effect of Oxygen Plasma Treatment of Indium Tin Oxide for Organic Light-Emitting Devices with Iodogallium Phthalocyanine Layer

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-04-15

著者

• Hashimoto Y

  Shinshu Univ. Nagano Jpn

• HAMAGAKI Manabu

  The Institute of Physical and Chemical Research (RIKEN)

• SAKAKIBARA Takeshi

  Department of Electric, Electronic, and Communication Engineering, Faculty of Science and Engineerin

• HASHIMOTO Yuichi

  OL Project, Canon Inc.

• OSATO Yoichi

  OL Project, Canon Inc.

• TANAKA Masato

  OL Project, Canon Inc.

• Hamagaki M

  The Institute Of Physical And Chemical Research (riken)

• Hamagaki Manabu

  The Institute Of Physical And Chemical Research

• Osato Yoichi

  Ol Project Canon Inc.

• Sakakibara Takeshi

  Department Of Electric Electronic And Communication Engineering Faculty Of Science And Engineering C

• Tanaka Masato

  Department Of Electrical Engineering Faculty Of Engineering Osaka Institute Of Technology

• Hashimoto Yuichi

  Ol Project Canon Inc.

• Tanaka Masato

  Ol Project Canon Inc.

関連論文

• 40 nm Width Structure of GaAs Fabricated by Fine Focused Ion Beam Lithography and Chlorine Reactive Ion Etching : Techniques, Instrumentations and Measurement
• Induced Defects in GaAs Etched by Low Energy Ions in Electron Beam excited Plasma(EBEP) System : Etching and Deposition Technology
• Trap States of Tris-8-(Hydroxyquinoline)Aluminum Degraded by Blue Laser Using Thermally Stimulated Current Method
• Effect of Oxygen Plasma Treatment of Indium Tin Oxide for Organic Light-Emitting Devices with Iodogallium Phthalocyanine Layer
• Effect of Ionization Potential of Hole Transport Layer on Device Characteristics of Organic Light Emitting Diode with Oxygen Plasma Treated Indium Tin Oxide
• New Etching System with a Large Diameter Using Electron Beam Excited Plasma
• Cleaning of Glass Disk in Oxygen Plasma by Using Compact Electron-Beam-Excited Plasma Source
• Layer-By-Layer Controlled Digital Etching by Means of an Electron-Beam-Excited Plasma System : Etching and Deposition Technology
• Layer-By-Layer Controlled Digital Etching by Means of an Electron-Beam-Excited Plasma System
• New High Current Low Energy Ion Source
• Hall Mobility Enhancement in AgBiTe_2-Ag_2Te Composites
• (AgBiTe_2)_(Ag_2Te)_x複合材料の熱電特性
• A Transverse Electron Beam Source for the Excitation of CW Lasers
• Deposition of Diamond-Like Carbon Using Compact Electron-Beam-Excited Plasma Source
• Investigation of Nitrogen Atoms in Low-Pressure Nitrogen Plasmas Using a Compact Electron-Beam-Excited Plasma Source
• CW Ar^+ Laser Pumped by an Intense Electron Beam
• Quasi-Steady Population Inversions of He^+ in a Freely Expanding Plasma
• Quasi-Steady Laser Oscillation in the Recombining Hydrogen Plasma
• Observation of Population Inversions in a Freely Expanding Pure Hydrogen Plasma
• Surface States of Mica and Contact Charging
• Deposition of Nitrogen Doped Carbon Film by Electrolysis of Methanol-Ammonia Solution
• Potential Profiles in an Electron-Beam-Excited Plasma ( Plasma Processing)
• Control of Floating Potential in an Electron-Beam-Excited Plasma
• High Degree of Dissociation of Nitrogen Molecules in Large-Volume Electron-Beam-Excited Plasma
• Trap States of Tris-8-(Hydroxyquinoline)Aluminum Degraded by Blue Laser Using Thermally Stimulated Current Method
• Effect of Ionization Potential of Hole Transport Layer on Device Characteristics of Organic Light Emitting Diode with Oxygen Plasma Treated Indium Tin Oxide

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