Control of Floating Potential in an Electron-Beam-Excited Plasma
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概要
- 論文の詳細を見る
Control of the floating potential is demonstrated experimentally in a high-density reactive plasma without using external DC or RF bias. The difference between the floating potential and the space potential in an electron-beam-excited plasma (EBEP) can be easily controlled in the range of 20-90 V by changing the accelerating voltage of the electron beam or the angle between the electron beam and the probe surface.
- 社団法人応用物理学会の論文
- 1994-03-01
著者
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Hara Tamio
The Institute Of Physical And Chemical Research
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Hamagaki Manabu
The Institute Of Physical And Chemical Research
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