Light Figure Phenomena Revealed and Crystal Faces Developed by Chemical Etching in Silicon Crystal

概要

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The light-figure phenomenon of silicon single crystals etched with various chemical reagents has been studied in order to find out the light figures or the etching conditions appropriate for the orientation determination and to obtain information regarding crystal faces developed by etching. The etching with aqueous solutions of KOH and of NaOH, boiled or heated at 100°or 70℃, produce distinct {100}, {110}, and {111} light figures, while any other oxidizable reagent reveals only indistinct light figures or no light figure at all. It has been found that, for the orientation works, the etching with saturated aqueous solutions of KOH and of NaOH, heated over some 100℃ are most suitable in view of the shortness of the required etching time (<2〜3 minutes). The crystal faces developed by etching with alkaline reagents depend on the kind, concentration, and temperature of the reagent as well as on the time of etching, and they belong to the <100> and <110> zones, the {111} and {100} faces being commonly developed.
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