Donor Levels in Si-Doped AlGaAs Grown by MBE
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概要
- 論文の詳細を見る
Donor levels of MBE-grown Si-doped Al_xGa_<1-x>As have been characterized by a combination of the C-V method and capacitance and current transient spectroscopy. Although most electrons are supplied by so-called DX centers in the AlAs mole fraction (x) range of 0.3〜0.7 in this material, it is found that a small amount of shallow donors are still present. The concentrations of the DX center and the shallow donor are determined in detail as a function of AlAs mole fraction and Si doping level. The activation energy obtained by the Hall effect measurement is discussed in association with these data.
- 社団法人応用物理学会の論文
- 1984-02-20
著者
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Morizuka Kouhei
Toshiba Research and Development Center
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Mashita Masao
Toshiba R & D Center
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Mashita Masao
Toshiba Research And Development Center
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Ashizawa Yasuo
Toshiba Research And Development Center
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Ashizawa Yasuo
Toshiba R & D Center
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Zohta Yasuhito
Toshiba Research And Development Center
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WATANABE Miyoko
Toshiba R&D Center
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Watanabe Miyoko
Toshiba Research And Development Center
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Watanabe Miyoko
Toshiba R & D Center
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