In Situ Reflection High Energy Electron Diffraction Observation During Growth of YBa_2Cu_3O_<7-x> Thin Films by Activated Reactive Evaporation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-06-20
著者
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Terashima Takahito
Institute for Chemical Research, Kyoto University
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Bando Yoshichika
Institute for Chemical Research, Kyoto University
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BANDO Yoshichika
The Institute for Chemical Research,Kyoto University
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Bando Y
The Institute For Chemical Research Kyoto University
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Bando Yoshichika
Institute For Chemical Reaearch Kyoto University
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Yamamoto K
Univ. Of Tsukuba
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Iijima Kenji
Research Institute For Production Development
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Iijima Kenji
Environmental Technology Research Laboratory Matsushita Electric Industrial Co. Ltd.
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Hirata Kazuto
Research Institute for Production Development
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Yamamoto Kazunuki
Research Institute for Production Development
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TAKADA Toshio
Okayama University of Science
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Yamamoto K
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Terashima Takahito
Institute For Chemical Reaearch Kyoto University
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Yamamoto K
Saga Univ. Saga Jpn
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