Penetration Depth of Diffusion-Induced Dislocations
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概要
- 論文の詳細を見る
To estimate the penetration depth of diffusion-induced dislocations, the depth of the neutral plane of internal stress is obtained quantitatively in values relative to the junction depth of the usual diffusion profiles. The following two cases are considered: (1) the stress distribution is due mainly to the distribution of impurity atoms and (2) the stress is relieved by the generation of a majority of dislocations. The shallow penetration of (1/3-2/3)X_j observed so far is explained by case (1). Deep penetration beyond the junction is shown to be generally possible only in case (2) and at this time, the change of the depth of the neutral plane depends on the moment of the dislocation distribution. It is also explained that the force on a dislocation due to the diffusion-induced stress causes the climbing motion.
- 社団法人応用物理学会の論文
- 1983-07-20
著者
-
ITOH Nobuo
Department of Pathology, Sinshu University Medical School
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NAKAU Tanehiro
Department of Electronics, University of Osaka Prefecture
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Nakau Tanehiro
Department Of Electronic Engineering College Of Engineering University Of Osaka Prefecture
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Itoh Nobuo
Department Of Clinical Pathology Iida Municipal Hospital
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