p-CuGa_<1-x>In_xS_2/n-ZnSe Heterojunction by LPE Method from In Solution
スポンサーリンク
概要
- 論文の詳細を見る
p-CuGa_<1-x>In_xS_2/n-ZnSe heterojunction was made by the LPE method from the In solution of solute CuGaS_2 and solvent In, though a p-CuGaS_2/n-ZnSe heterojunction was not obtained. The reflection electron diffraction pattern from the interface indicates an epitaxial growth. The measurements of EPMA have shown that Zn and Se decrease monotonically, and Cu, Ga and S increase monotonically, from the substrate to the over-growth layer. Indium from the solvent showed a monotonic increase from the substrate to the over-growth layer. The maximum temperature T_m of 650℃ and cooling rate of 0.5℃/min were taken. The epitaxial layer is represented by the formula CuGa_<1-x>In_xS_2, where x was 0.16 for T_m of 650℃. It is suggested that a complete series of solid solutions (CuGa_<1-x>In_xS_2)_<1-y>-(2ZnSe)_y alloys is formed. The thickness of the mixedcrystal layer was 4.9 μm.
- 社団法人応用物理学会の論文
- 1981-10-05
著者
-
NAKAU Tanehiro
Department of Electronics, University of Osaka Prefecture
-
Nakau Tanehiro
Department Of Electronic Engineering College Of Engineering University Of Osaka Prefecture
-
TAKENOSHITA Hiroshi
Department of Electronics, College of Engineering, Urtiversity of Osaka Prefecture
-
Takenoshita Hiroshi
Deparment Of Elctronics College Of Engineering University Of Osaka Prefecture
関連論文
- Transient Photocurrent in Amorphous (As_2Se_3):Te Thin Films
- Transient Photodischarge Characteristics of Photoconductors with Dispersive Transport
- Isothermal Photocurrent Transient Spectroscopy of Gap States in Amorphous Chalcogenide Semiconductors
- Gap State Spectroscopy in Amorphous Selenium Photoreceptors
- Effect of Photo-Induced Microcrystallization on In_x(Si_Se_)_ Film-ITO Solar Cells : I-3: NEW STRUCTURE AND ADVANCED MATERIAL (1)
- Effect of Electron Traps on Residual Voltage in Chalcogenide Photoreceptors
- The Density of Localized States in Amorphous In_xSe_ Thin Films
- Some Properties of Copper Sulfide Films Related with the Conductivities
- X-Ray Micrographic Observation of Imperfections in Si Wafer near the Oxide Film Edge before and after the Localized Diffusion
- Effects of Heat Treatment of CdSe Single Crystals in Se Vapor
- Electrical Conductivity of α-Fe_2O_3
- Anomalous X-Ray Images of Imprefections in Boron-Diffused Silicon
- A Theoretical Investigation of the Residual Voltage on Electrophotographic Plates
- Nondestructive Internal Observation and Distribution of Potential with Bias Application of npn Si Darlington Transistor Chip Using Electron-Acoustic Microscopy
- Observation of Dislocation Lines in a Transistor by Electron-Acoustic Microscopy : Acoustical Measurements and Instrumentation
- Bonds in CdSiP_2 Studied by Thermal Expansion Coefficients
- Birefringence in CdSiP_2
- p-CuGa_In_xS_2/n-ZnSe Heterojunction by LPE Method from In Solution
- LPE Growth of ZnSnAs_2 on a ZnSe Substrate from a Sn Solution
- Electrical and Optical Properties of p・ZnSnAs_2/n・ZnSe Heterodiode
- The Hall Measurement of Heat-Treated CuInSe_2
- Penetration Depth of Diffusion-Induced Dislocations
- Preparation and some Properties of CuInSe_2 on ZnSe Heterojunction Grown by LPE : CHALCOPYRITES : THIN FILMS AND JUNCTIONS
- Inhomogeneous Distributuon of Dislocations in Phosphorus-Diffused Silicon
- Liquid Phase Epitaxial Growth of CuGaTe_2 on ZnSe from Bi Solution
- X-Ray Topographic Studies of Strains in Silicon Implanted with In Ions at High Doses
- Heteroepitaxy of CuInS_2 on ZnSe by LPE Method from In Solution
- Effective Range of Observable Depth by Electron-Acoustic Microscopy Using Two-Phase Electron Acoustic Signals : Ultrasonic Measurement
- Electron-Acoustic Microscopic Study on Dislocation Lines in the Base Region of npn Si-Tr : Ultrasonic Microscopy and Nondestructive Testing
- Site of Ultrasonic Signal Generation from a Junction of a Transistor-Chip by Excitation of the Chopped Electron Beam
- Site of Electron Acoustic Signal Generation from Junction of an npn Si Transistor-Chip under Bias Application : Physical Acoustics
- Depth Directional Study by Electron-Acoustic Microscopy : Photoacoustic Spectroscopy and Ultrasonic Microscopy
- Contrast of Electron-Acoustic Microscopic Image : For Si Tr-Chip under Bias Application : Ultrasonic Imaging and Microscopy
- Nondestructive Profiling of Transistor-Chip under Bias Application by Electron-Acoustic Microscopy : Ultrasonic Imaging and Microscopy
- Cathodoluminescence Study on Diffusion Coefficients of Al, Ga and In in ZnSe
- Generation of Electron-Acoustic Signals and Distribution of Potential in Transistor Chip under Applied of Bias
- The Range of Observable Depth in a pnp Si Darlington Tr-Chip by Electron-Acoustic Microscopy : Mechanical and Scoustical Properties
- Imaging of a Diffused Region in a Si Tr-Chip by Electron-Acoustic Microscopy (EAM) : Ultrasonic Imaging and Microscopy
- A Study of Silicon Transistor-Tip by Electron-Acoustic Microscopy
- LPE Growth of CuGa_In_xS_2 on ZnSe Substrate Using a Mixture of CuGaS_2 and CuInS_2 as a Solute