X-Ray Micrographic Observation of Imperfections in Si Wafer near the Oxide Film Edge before and after the Localized Diffusion
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1968-01-05
著者
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Nakahara Osamu
Semiconductor Division Tokyo Sanyo Electric Company
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ITO Nobuo
Department of Pathology,Shinshu University,School of Medicine
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NAKAU Tanehiro
Department of Electronics, University of Osaka Prefecture
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NIMURA Hiroshi
Department of Surgery, Jikei University School of Medicine
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Nimura Hiroshi
Department Of Electronic Engineering College Of Engineering University Of Osaka Prefecture
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Nakau Tanehiro
Department Of Electronic Engineering College Of Engineering University Of Osaka Prefecture
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Ito Nobuo
Department Of Electronic Engineering College Of Engineering University Of Osaka Prefecture
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