A Comparative High-Resolution Electron Microscope Study of Ag Clusters Produced by a Sputter-Gas Aggregation and Ion Cluster Beam Technique

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Ag clusters were formed by a sputter-gas-aggregation process [H. Haberland et al.:J. Vac. Sci. Technol. A 10 (1992) 3266] and the ionized cluster beam (ICB) [T. Takagi:Ionized-Cluster Beam Deposition and Epitaxy (Noyes, Park Ridge, 1988)] technique. The Ag clusters deposited on collodion-coated microgrids were investigated by high-resolution transmission electron microscopy. The diameter of those clusters, d, ranges from 1 nm up to abotut 10 nm for specimens produced by the sputter-gas aggregation technique, depending on the sputter condition and the deposition time. Comparable times of the ICB deposition lead to a broader distribution up to d 〓 20 nm, suggesting the formation of islands with extremely flat shapes, High percentages of crystalline particles obtained by both techniques are either single crystals or multiple twins with clear lattice images.
社団法人応用物理学会の論文
1994-03-15