A Q-Band High Gain, Low Noise Variable Gain Amplifier Using Dual Gate AlGaAs/InGaAs Pseudomorphic HEMTs
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概要
- 論文の詳細を見る
A Q-band high gain and low noise Variable Gain Amplifier (VGA) module using dual gate AlGaAs/InGaAs pseudomorphic HEMTs has been developed. The dual gate HEMT can be fabricated by the same process of the single gate HEMT which has the gate length of 0.15μm. The Q-band VGA module consists of a 1-stage low noise amplifier (LNA) MMIC using a single gate HEMT and a 2-stage VGA MMIC using dual gate HEMTs. During the design, an accurate noise modeling is introduced to achieve low noise performance. A fully passivated film is employed to achieve reliability. The VGA module has a gain of more than 20 dB from 41 GHz to 52 GHz and a maximum gain of 24.5 dB at 50 GHz. A gain control range of more than 30 dB is achieved in the same frequency range. A phase deviation is less than 10 degrees in 10 dB gain control range. A minimum noise figure of 1.8 dB with an associated gain of 22 dB is achieved at 43 GHz and the noise figure is less than 2.5 dB with associated gain of more than 20 dB from 41 GHz to 46 GHz when biased for low noise figure. This performance is comparable with the best data ever reported for LNAs at Q-band including both GaAs based HEMTs and InP based HEMTs.
- 社団法人電子情報通信学会の論文
- 1996-04-25
著者
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YOSHIDA Naohito
Optoelectronic and Microwave Devices R&D Laboratory, Mitsubishi Electric Corporation
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Minami Hiroyuki
Optoelectronic And Microwave Devices Laboratory Mitsubishi Electric Corporation
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KASHIWA Takuo
Optoelectronic and Microwave Devices Laboratory, Mitsubishi Electric Corporation
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KATOH Takayuki
Optoelectronic and Microwave Devices Laboratory, Mitsubishi Electric Corporation
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KITANO Toshiaki
Optoelectronic and Microwave Devices Laboratory, Mitsubishi Electric Corporation
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KOMARU Makio
Optoelectronic and Microwave Devices Laboratory, Mitsubishi Electric Corporation
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TANINO Noriyuki
Optoelectronic and Microwave Devices Laboratory, Mitsubishi Electric Corporation
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TAKAGI Tadashi
Optoelectronic and Microwave Devices Laboratory, Mitsubishi Electric Corporation
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ISHIHARA Osamu
High Frequency amptical Semiconductor Division, Mitsubishi Electric Corporation
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Takagi T
Optical Interconnection Sumiden Laboratory Rwcp
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Ishihara O
Mitsubishi Electric Corp. Itami‐shi Jpn
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Katoh T
Nippon Leiz Co. Ltd. Tama‐shi Jpn
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Katoh Takayuki
High Frequency & Optical Semiconductor Div. Mitsubishi Electric Corporation
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Katoh Takayuki
Optoelectronic And Microwave Devices Laboratory
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Minami Hiroyuki
Optoelectronic & Microwave Devices Laboratory Mitsubishi Electric Corp.
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Minami H
Ntt Corp. Musashino‐shi Jpn
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Takagi T
Research Institute Of Electrical Communication Tohoku University
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Komaru M
Optoelectronic And Microwave Devices Laboratory Mitsubishi Electric Corporation
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Komaru Makio
Optoelectronic And Microwave Devices Laboratory Mitsubishi Electric Corporation
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Kashiwa Takuo
High Frequency & Optical Semiconductor Div. Mitsubishi Electric Corporation Department Of Physic
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Tanino N
Mitsubishi Electric Corp. Itami‐shi Jpn
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Tanino Noriyuki
Optoelectronic And Microwave Devices Laboratory Mitsubishi Electric Corporation
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Ishihara O
Department Of Physics Faculty Of Engineering Yokohama National University
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Yoshida N
Mitsubishi Electric Corp. Itami‐shi Jpn
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Yoshida Naohito
Optoelectronic And Microwave Devices R&d Laboratory Mitsubishi Electric Corporation
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Yoshida Naohito
Optoelectronic and Microwave Devices Laboratory, Mitsubishi Electric Corporation
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Tanino Noriyuki
Optoelectronic amp Microwave Devices Laboratory, Mitsubishi Electric Corporation
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