In Situ Studies on Oxidation of Copper Films by Using ATR Technique
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概要
- 論文の詳細を見る
Oxidation studies of copper films at room temperature have been carried out bymeasuring the ATR spectra involving information about surface plasmon polaritoncharacteristics. Oxidation is initially rapid, but after 10 to 20 minutes, drops to anegligible value, a stable film being formed - 2.7 nm thick. It has been furthermoreconfirmed that copper oxide films formed in 20 Torr of oxygen at room temperatureare composed of a mixture of Cu and Cub.... (gross defect structure of Cu.0) in thefirst stage of oxidation, but the final composition becomes Cub..,.
- 社団法人日本物理学会の論文
- 1985-11-15
著者
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Tajima Naoyuki
Department Of Electronic Engineering The University Of Tokushima
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TADA Osamu
Department of Biochemical Science and Technology, Faculty of Agriculture, Kagoshima University
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Fukui Masuo
Department Of Electrical And Electronic Engineering Faculty Of Engineering The University Of Tokushi
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Fukui Masuo
Department Of Electronic Engineering The University Of Tokushima
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HSINTANI Yoshihiro
Department of Electronic Engineering,The University of Tokushima
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Tada Osamu
Department Of Biochemical Science And Technology Faculty Of Agriculture Kagoshima University
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Tada Osamu
Department Of Electronic Engineering The University Of Tokushima
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Hsintani Yoshihiro
Department Of Electronic Engineering The University Of Tokushima
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