窒化けい素焼結体のメカノケミカルポリシング

概要

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The present paper studies the feasibility of a new method for polishing sintered silicon nitride to make a damage- and scratch-free surface. The method contains development of a polishing disk, on which the workpiece is polished under a dry condition. The polishing disk is a composite consisting of an oxide abrasive and a thermoplastic resin. Various polishing disks and polishing conditions were examined to find the optimum condition. The results may be summarized as follows : (1) Sintered Si_3N_4 can be polished accurately and efficiently by means of the polishing disk, especially Cr_20_3 (chromium oxide)-AN (acrylonitrile) polishing disk. The rate of material removed reaches 22 μm/km・MPa (32 μm/h) and a surface roughness of 4 nmR_<max> can be easily obtained. (2) Surface analyses of the polished surfaces by ESCA and SIMS indicate that a certain reaction layer is formed on the Si_3N_4 Surface during the polishing process as a result of some mechanochemical reaction between Si_3N_4 and Cr_20_3. The efficiency of the present method is due to the fact that the polishing disk can supply the abrasives which are mechanochemically reactive on the Si_3N_4,into the polished surface very continuously, efficiently and uniformly.
公益社団法人精密工学会の論文
1989-12-05