<報文>イオンビームデポジション (IBD) 法で作製した鉄薄膜の超高圧電子顕微鏡による評価

概要

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The microstructures of Fe thin films prepared by ion beam deposition (IBD) method were investigated on an atomic scale using high-voltage HREM. It was found that the Fe film obtained by ion irradiation with the energy of 50eV having an excellent corrosion resistance consists of the amorphous layer of about 15nm in thickness and the bcc crystalline layer of several tens nanometers in grain size, while the film obtained by that of 100eV having a poor corrosion resistance consists of little amorphous layer and the defective crystalline layer. Furthermore, the crystal structures and arrangements of the natural oxide layers formed on the surfaces of the Fe films were clarified by processing of the HREM images.Fe thin filmion beam depositionhigh-voltage HREMcorrosion resistanceamorphous layerdefective crystalline layernatural oxide
東北大学の論文
1998-03-27