Pdを触媒に用いた酸化亜鉛薄膜の無電界析出における成長条件の影響(<特集>水溶液科学に立脚したセラミックス合成プロセス)

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ZnO films were electrolessly deposited in the aqueous solution of zinc nitrate and dimethylamine-borane (DMAB). ZnO was deposited on the Pd catalyst layer grown by sputtering on the quartz substrate. The influences of the growth conditions to the morphology of the ZnO films have been examined. Amorphous gel-like deposits were observed at 30℃. Both amorphous gel and ZnO crystals were deposited at 40℃. Above 55℃, ZnO mono-particulate films with few particles being observed on them were obtained. The morphology of the ZnO depended on the concentration of Zn (0.01-0.5mol・dm^<-3>). In a low Zn concentration, spindle-shaped particles composed of fibers were deposited. In a high Zn concentration, platelet deposits of a few micrometers were observed. For deposition of hexagonal shape ZnO, the Zn concentration of 0.05mol・dm^<-3> was suited. The concentrations of DMAB (0.001-0.05mol・dm^<-3>) did not influence the morphology of the deposits. At 55℃, the deposition began just after soaking in the solution. Initially, the agglomerated particles of about 200nm composed of small particles (10-30nm) were deposited. According to the particle growth, the particles became hexagonal in shape. The hexagonal ZnO particles grew to micron sizes by the reaction for 4h. At high reaction temperatures, the initial nucleation density was higher, and ZnO films of finer particles were obtained in a short period. After the catalyst layer was covered by ZnO, the growth rate became slow, but the growth continued due to the thermal decomposition of DMAB.
社団法人日本セラミックス協会の論文
2007-12-01

Pdを触媒に用いた酸化亜鉛薄膜の無電界析出における成長条件の影響(<特集>水溶液科学に立脚したセラミックス合成プロセス)

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