Etching a Micro-Trench with a Maximum Aspect Ratio of 60 on Silica Glass by Laser-Induced Backside Wet Etching (LIBWE)
スポンサーリンク
概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2005-02-10
著者
-
NARAZAKI Aiko
Photoreaction Control Research Center, National Institute of Advanced Industrial Science and Technol
-
KAWAGUCHI Yoshizo
Photoreaction Control Research Center, National Institute of Advanced Industrial Science and Technol
-
NIINO Hiroyuki
Photoreaction Control Research Center, National Institute of Advanced Industrial Science and Technol
-
Niino H
National Inst. Advanced Industrial Sci. And Technol. Aist Ibaraki Jpn
-
Niino H
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
-
Niino Hiroyuki
Photonic Research Institute National Institute Of Advanced Industrial Science And Technology
-
Niino Hiroyuki
National Institute For Materials And Chemical Research
-
SATO Tadatake
Photoreaction Control Research Center, National Institute of Advanced Industrial Science and Technol
-
Kawaguchi Y
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
-
KUROSAKI Ryozo
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST
-
Narazaki Aiko
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
-
Sato Tadatake
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
-
Sasaki T
Nanoarchitectonics Research Center Aist
-
Kurosaki Ryozo
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
-
Kawaguchi Yoshizo
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
関連論文
- Preparation of PbTiO_3 Thin Films Using a Coating Photolysis Process with ArF Excimer Laser
- Direct Conversion of Metal Acetylacetonates and Metal Organic Acid Salts into Metal Oxides Thin Films Using Coating Photolysis Process with An ArF Excimer Laser
- Direct Conversion of Titanium Alkoxide into Crystallized TiO_2 (rutile) Using Coating Photolysis Process with ArF Excimer Laser
- Critical Current Densities at 77 K in Ba_2YCu_3O_-Ag Films Prepared by Dipping-Pyrolysis Process
- Improvement in Electrical Conductivity of Indium Tin Oxide Films Prepared via Pulsed Laser Deposition on Electric-Field-Applied Substrates(Optics and Quantum Electronics)
- Micromachining of Silica Glass Using EUV Radiation of Laser-Produced Plasma
- Micromachining of Silica Glass Using EUV Radiation of Laser-Produced Plasma (特集 量子ビームによるナノバイオエレクトロニクス)
- Laser-Induced Backside Wet Etching of Sapphire
- Gas Source MBE Growth of High-Quality InP Using Triethylindium and Phosphine
- MBE Growth of High-Quality InP Using Triethylindium as an Indium Source
- Microfabrication of a Fluoropolymer Film Using Conventional XeCl Excimer Laser by Laser-Induced Backside Wet Etching
- Laser Ablation of Poly(methylmethacrylate) Doped with Aromatic Compounds : Laser Intensity Dependence of Absorption Coefficient
- Nonlinear Absorption Coefficient of PMMA Doped with Benzil for Analysis of Excimer Laser Ablation
- Formation of Elastic Cone-Like Microstructures on the Composite of Elastomer and Carbon Black by Excimer Laser Ablation
- Molecular Orientation of Liquid Crystalline Polymer Films Fabricated by Polarized-Laser Chemical Vapor Deposition
- Anisotropic Molecular Orientation of Poly(o-trimethylsilyl)-Phenylacetylene Film Swollen under High Magnetic Field
- 0.8 μm CMOS Process Compatible 60 V-100 mΩ・mm^2 Power MOSFET on Bonded SOI
- 0.8μm CMOS Process Compatible 60V - 100mΩ・mm^2 Power MOSFET on Bonded SOI
- Nano- and Microdot Array Formation of FeSi_2 by Nanosecond Excimer Laser-Induced Forward Transfer
- Synthesis and Photolysis of Biphenylenetetracarboxylic Dianhydride in Low-temperature Neon Matrixes
- Fabrication of a Novel Microfluidic Device Incorporating 2-D Array of Microbeads
- Etching a Micro-Trench with a Maximum Aspect Ratio of 60 on Silica Glass by Laser-Induced Backside Wet Etching (LIBWE)
- Effect of Annealing on the Tolerance of LiCaAlF_6 Single Crystals against F_2 Laser Irradiation
- ZnCdSe/ZnSe Quantum-Well Laser Diode on a (711)A GaAs Substrate
- High-Power, Continuous-wave and Blue Light Generation by Intracavity Frequency Doubling of a Cr:LiSrAlF_6 Laser
- 67-mW Continuous-Wave Blue Light Generation by Intracavity Frequency Doubling of a Diode Pumped Cr:LiSrAlF_6 Laser
- Resistance of LiCaAlF_6 Single Crystals against F_2 Laser Irradiation
- Effect of High-Temperature Annealing in Vacuum and Hydrogen on Paramagnetic Defects in Diamond Films Grown by Chemical Vapor Deposition
- Characteristics of Excimer-Laser-Induced Luminescence of the Ground Surface of Silica Glass
- Nano-Ablation of Inorganic Materials Using Laser Plasma Soft X-rays at around 10 nm
- Direct Etching of Poly(methyl methacrylate) Using Laser Plasma Soft X-rays
- Laser Ablation of Transparent Materials by UV fs-Laser Irradiation
- Etching a Micro-Trench with a Maximum Aspect Ratio of 60 on Silica Glass by Laser-Induced Backside Wet Etching (LIBWE)
- Effect of Annealing on the Tolerance of LiCaAlF6 Single Crystals against F2 Laser Irradiation
- Laser-Induced Backside Wet Etching of Sapphire