Laser-Induced Backside Wet Etching of Sapphire
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-02-15
著者
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Ding Ximing
Photoreaction Control Research Center National Institute Of Advanced Industrial Science And Technolo
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KAWAGUCHI Yoshizo
Photoreaction Control Research Center, National Institute of Advanced Industrial Science and Technol
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NIINO Hiroyuki
Photoreaction Control Research Center, National Institute of Advanced Industrial Science and Technol
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Niino Hiroyuki
Photonic Research Institute National Institute Of Advanced Industrial Science And Technology
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Niino Hiroyuki
Photoreaction Control Research Center National Institute Of Advanced Industrial Science And Technolo
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SATO Tadatake
Photoreaction Control Research Center, National Institute of Advanced Industrial Science and Technol
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Sato Tadatake
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Sato Tadatake
Photoreaction Control Research Center National Institute Of Advanced Industrial Science And Technolo
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Kawaguchi Y
Photoreaction Control Research Center National Institute Of Advanced Industrial Science And Technolo
関連論文
- Improvement in Electrical Conductivity of Indium Tin Oxide Films Prepared via Pulsed Laser Deposition on Electric-Field-Applied Substrates(Optics and Quantum Electronics)
- Micromachining of Silica Glass Using EUV Radiation of Laser-Produced Plasma
- Micromachining of Silica Glass Using EUV Radiation of Laser-Produced Plasma (特集 量子ビームによるナノバイオエレクトロニクス)
- Laser-Induced Backside Wet Etching of Sapphire
- Nano- and Microdot Array Formation of FeSi_2 by Nanosecond Excimer Laser-Induced Forward Transfer
- Synthesis and Photolysis of Biphenylenetetracarboxylic Dianhydride in Low-temperature Neon Matrixes
- Fabrication of a Novel Microfluidic Device Incorporating 2-D Array of Microbeads
- Etching a Micro-Trench with a Maximum Aspect Ratio of 60 on Silica Glass by Laser-Induced Backside Wet Etching (LIBWE)
- Effect of Annealing on the Tolerance of LiCaAlF_6 Single Crystals against F_2 Laser Irradiation
- Resistance of LiCaAlF_6 Single Crystals against F_2 Laser Irradiation
- Nano-Ablation of Inorganic Materials Using Laser Plasma Soft X-rays at around 10 nm
- Direct Etching of Poly(methyl methacrylate) Using Laser Plasma Soft X-rays
- Etching a Micro-Trench with a Maximum Aspect Ratio of 60 on Silica Glass by Laser-Induced Backside Wet Etching (LIBWE)
- Effect of Annealing on the Tolerance of LiCaAlF6 Single Crystals against F2 Laser Irradiation
- Laser-Induced Backside Wet Etching of Sapphire