Etching a Micro-Trench with a Maximum Aspect Ratio of 60 on Silica Glass by Laser-Induced Backside Wet Etching (LIBWE)
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概要
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We have successfully fabricated a deep micro-trench about 7 μm wide and 420 μm deep on silica glass with a maximum aspect ratio of 60 by laser induced backside wet etching (LIBWE) via KrF laser ablation of a saturated pyrene/acetone solution. The processing time for the microetching was as short as 5 min at a repetition rate of 80 Hz and a fluence of $F = 1.0$ J$\cdot$cm-2$\cdot$pulse-1. The etch rate was calculated to be approximately 17 nm$\cdot$pulse-1. The LIBWE method is shown to be very useful for surface microstructuring of silica glass with high aspect ratio and high throughput.
- 2005-01-10
著者
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Niino Hiroyuki
Photonic Research Institute National Institute Of Advanced Industrial Science And Technology
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Narazaki Aiko
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Sato Tadatake
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Kurosaki Ryozo
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Kawaguchi Yoshizo
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
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Narazaki Aiko
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
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Kurosaki Ryozo
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
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Kawaguchi Yoshizo
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
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Niino Hiroyuki
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
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Sato Tadatake
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
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